System for electron beam lithography - REISSUE

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The subject matter of this Public Contract is supply (acquisition) of a system for drawing custom shapes at resolution on the order of at least 20 nm and that on a surface covered with an electron-sensitive film using a focused beam of electrons and enabling selective removal of either the exposed or non-exposed regions of the surface. The tender documents are available for download at the Contracting Authority's profile https://www.e-zakazky.cz/profil-zadavatele/74e987e1-b4a1-4571-b8b6-2cd93fe6f932 Any other information on the procurement procedure will also be published on the above-mentioned Contracting Authority's profile.